Share Email Print

Proceedings Paper

First photomask developer based on state-of-the-art wafer processing technology
Author(s): Peter Tichy; Takahiro Fukai; Shigenori Kamei; Hiroshi Asai; Tatsuhito Kotoda; Kazuhiro Takeshita; Tetsushi Miyamoto; Yoshiki Okamoto; Hideo Funakoshi; Shinji Koga; Shigemi Oono; Rusty Cantrell; Axel Feicke; Wolfram Porsche; Martin Tschinkl; Gaston Lee
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The challenges, mask manufacturing is faced with, are more and more dominating the semiconductor industry as the pattern sizes shrink. Today's mask patterns have reached sizes that are common in wafer manufacturing. Looking into the industry, we can see that some of the quality parameters - such as CD uniformity and defect control - are managed better in wafer than in mask manufacturing. Consequently, mask manufacturers have started to apply more wafer processing techniques to mask processes. Among others, develop process has a great impact on the quality of the mask manufacturing. This contribution describes how Tokyo Electron Limited (TEL) scanning (linear drive nozzle) developer processing (widely used in advanced wafer manufacturing) was adapted for mask development. Out of this technology transfer, a new alpha-type mask develop tool was launched at TEL and an evaluation of this tool was carried out at the Advanced Mask Technology Center (AMTC), Dresden, Germany. Target of this collaboration was to successfully transfer wafer processing technology to mask making. By this, valuable information was generated, that has been implemented into the production platform, which is commercialized since first half of 2004.

Paper Details

Date Published: 6 December 2004
PDF: 12 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.568820
Show Author Affiliations
Peter Tichy, Tokyo Electron Ltd. (Japan)
Takahiro Fukai, Tokyo Electron Ltd. (Japan)
Shigenori Kamei, Tokyo Electron Ltd. (Japan)
Hiroshi Asai, Tokyo Electron Ltd. (Japan)
Tatsuhito Kotoda, Tokyo Electron Ltd. (Japan)
Kazuhiro Takeshita, Tokyo Electron Ltd. (Japan)
Tetsushi Miyamoto, Tokyo Electron Ltd. (Japan)
Yoshiki Okamoto, Tokyo Electron Ltd. (Japan)
Hideo Funakoshi, Tokyo Electron Ltd. (Japan)
Shinji Koga, Tokyo Electron Ltd. (Japan)
Shigemi Oono, Tokyo Electron Ltd. (Japan)
Rusty Cantrell, Advanced Mask Technology Ctr. (Germany)
Axel Feicke, Advanced Mask Technology Ctr. (Germany)
Wolfram Porsche, Advanced Mask Technology Ctr. (Germany)
Martin Tschinkl, Advanced Mask Technology Ctr. (Germany)
Gaston Lee, Advanced Mask Technology Ctr. (Germany)

Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

© SPIE. Terms of Use
Back to Top