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Proceedings Paper

Patterning performance of most recent e-beam-sensitive CARs for advanced mask making: an update
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Paper Abstract

Recently developed positive tone CARs (pCAR) and negative tone CARs (nCAR) have been evaluated for mask making using a 50kV e-beam pattern generator. We determined a screening method considering the most important parameters for example resolution, profile, delay influences, line edge roughness (LER), which was identically applied for all investigated resist samples. The screening was accomplished on 6025 chrome blanks using a state-of-the-art mask line. Some of the investigated resists have shown promising progress in terms of straight profile, of reduced footing, of lower line edge roughness and of an almost insensitive influence of the post exposure delay. Unfortunately, all the improvements were not unified in one sample.

Paper Details

Date Published: 6 December 2004
PDF: 12 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.568819
Show Author Affiliations
Anatol Schwersenz, IMS Chips (Germany)
Joerg Butschke, IMS Chips (Germany)
Axel Feicke, Advanced Mask Technology Ctr. (Germany)
Mathias Irmscher, IMS Chips (Germany)
Peter Voehringer, IMS Chips (Germany)


Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

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