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Proceedings Paper

Resist model calibration using 2D developed patterns for low-k1 process optimization and wafer printing predictions
Author(s): Ting Chen; Douglas Van Den Broeke; Sean Park; Armin Liebchen; J. Fung Chen; Stephen Hsu; Jung Chul Park; Linda Yu; Keith Gronlund
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Paper Abstract

We describe a new resist model calibration procedure and its implementation in LithoCruiserTM. In addition to the resist calibration, LithoCruiser is used to perform simultaneous optimization for numerical aperture (NA), mask OPC, and illumination profile with built-in manufacturing constraints for ASML illumination diffractive optical elements (DOE). This calibration procedure uses a global optimization algorithm for resist parameter tuning, matching the simulated and measured 2D resist contours at a user-defined multiple CD sampling across the selected developed 2D resist patterns. Using lumped parameter type resist models and vector high-NA simulation engine, this resist calibration procedure showed an excellent calibration capability of max CD error range < ±4nm for the CPL 70nm DRAM patterns. Calibration results for CPL 130nm contact hole patterns are also included in this manuscript. Dependency of the calibrated model parameters on lithography process (i.e., Quasar, C-Quad illumination and at different defocus) and further improvements to a more predictable resist model are discussed.

Paper Details

Date Published: 6 December 2004
PDF: 11 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.568671
Show Author Affiliations
Ting Chen, ASML MaskTools, Inc. (United States)
Douglas Van Den Broeke, ASML MaskTools, Inc. (United States)
Sean Park, ASML MaskTools, Inc. (United States)
Armin Liebchen, ASML MaskTools, Inc. (United States)
J. Fung Chen, ASML MaskTools, Inc. (United States)
Stephen Hsu, ASML MaskTools, Inc. (United States)
Jung Chul Park, ASML MaskTools, Inc. (United States)
Linda Yu, ASML MaskTools, Inc. (United States)
Keith Gronlund, ASML MaskTools, Inc. (United States)


Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

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