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Proceedings Paper

Flexible MRC rules for OPC
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Paper Abstract

Optical Proximity Correction (OPC) can be formulated as a constrained optimization problem. The constraints are mask constraint rules for space and width. These are sometimes called Mask Rule Checks (MRC), or Design Rule Checks (DRC). At 90nm and below, intelligent constraint handling is required for good OPC. In this paper, we show a technique for OPC constraint checking which is built in to the OPC feedback algorithm. The system is flexible enough to allow relaxed rules for corner-to-corner checking versus edge-to-edge checking. Also, the system can categorize checks by the length of the edges being compared. Lastly, the system can create special checks from line-ends to other features, or any user-defined edge type to any other user-defined edge type. In addition, we present a method for multiple layer enclosure rules which can be used for multiple exposure OPC. These enclosure constraints are useful for assurance of overlay tolerance.

Paper Details

Date Published: 6 December 2004
PDF: 9 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.568420
Show Author Affiliations
Nicolas B. Cobb, Mentor Graphics Corp. (United States)
Eugene Miloslavsky, Mentor Graphics Corp. (United States)
George Lippincott, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

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