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Proceedings Paper

Contact layer printing using alternating phase-shifting masks: mask making, patterning results, and production implementation
Author(s): Rainer Pforr; Wolfgang Dettmann; M. Eisenhut; Mario Hennig; Detlef Hofmann; Joerg Thiele; Guido Thielscher
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Paper Abstract

Contact layers of the DRAM manufacturing process can be printed well using alternating phase-shifting masks. State-of-the-art mask making tools have sufficient performance to manufacture defect free contact masks. The enlarged process window compared to conventional masks allows to shrink the contacts size or to substitute advanced scanners by older generation steppers for contact layer patterning. Using older generation exposure systems may cause problems originating in worse lens aberration performance. A method will be described how to overcome overlay problems by applying a specifically designed OL measurement target.

Paper Details

Date Published: 2 June 2004
PDF: 10 pages
Proc. SPIE 5504, 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (2 June 2004); doi: 10.1117/12.568032
Show Author Affiliations
Rainer Pforr, Infineon Technologies AG (Germany)
Wolfgang Dettmann, Infineon Technologies AG (Germany)
M. Eisenhut, Infineon Technologies AG (Germany)
Mario Hennig, Infineon Technologies AG (Germany)
Detlef Hofmann, Infineon Technologies AG (Germany)
Joerg Thiele, Infineon Technologies AG (Germany)
Guido Thielscher, Infineon Technologies AG (Germany)


Published in SPIE Proceedings Vol. 5504:
20th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Uwe F. W. Behringer, Editor(s)

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