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Proceedings Paper

Exposure dose control for step-and-scan lithography
Author(s): Liping Guo; Huijie Huang; Xiangzhao Wang; Dongqing Zhang
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Paper Abstract

Exposure dose control technique in step-and-scan exposure lithography systems is discussed. The dose control principle for step-and-scan system is analyzed in depth. A dose control algorithm is proposed. Measurements of dose accuracy and repeatability are made on an experiment setup. Dose accuracy of 1.37% and dose repeatability of 0.31% are obtained using this dose control technique. Experiment results indicate that this dose control technique meets the requirement of sub-half-micron lithography.

Paper Details

Date Published: 27 January 2005
PDF: 6 pages
Proc. SPIE 5645, Advanced Microlithography Technologies, (27 January 2005); doi: 10.1117/12.567919
Show Author Affiliations
Liping Guo, Shanghai Institute of Optics and Fine Mechanics (China)
Graduate School of the Chinese Academy of Sciences (China)
Huijie Huang, Shanghai Institute of Optics and Fine Mechanics (China)
Xiangzhao Wang, Shanghai Institute of Optics and Fine Mechanics (China)
Dongqing Zhang, Shanghai Institute of Optics and Fine Mechanics (China)
Graduate School of the Chinese Academy of Sciences (China)


Published in SPIE Proceedings Vol. 5645:
Advanced Microlithography Technologies
Yangyuan Wang; Jun-en Yao; Christopher J. Progler, Editor(s)

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