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Proceedings Paper

Microstitching interferometry for nanofocusing mirror optics
Author(s): Hidekazu Mimura; Hirokatsu Yumoto; Satoshi Matsuyama; Kazuya Yamamura; Yasuhisa Sano; Kazumasa Ueno; Katsuyoshi Endo; Yuzo Mori; Makina Yabashi; Kenji Tamasaku; Yoshinori Nishino; Tetsuya Ishikawa; Kazuto Yamauchi
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Paper Abstract

Metrology plays more important role than machining in surface figuring at sub-nanometer accuracy. The microstitch-ing interferometry based on a microscopic interferometer having peak-to-valley (p-v) height accuracy of sub-nanometer order and lateral resolution higher than 20 mm was developed to measure surface figures of X-ray mir-ror optics. In addition, the relative angle determinable stitching interferometry was also developed to measure surface profiles of elliptical mirrors to realize hard X-ray nanofocusing. By combining the two interferometies, the absolute measurement accuracy of approximately 3 nm (peak-to-valley) was achieved in the measurement of a cylindrical sur-face having the same curvature as the elliptically designed shape to enable nanofocusing.

Paper Details

Date Published: 18 October 2004
PDF: 10 pages
Proc. SPIE 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II, (18 October 2004); doi: 10.1117/12.567511
Show Author Affiliations
Hidekazu Mimura, Osaka Univ. (Japan)
Hirokatsu Yumoto, Osaka Univ. (Japan)
Satoshi Matsuyama, Osaka Univ. (Japan)
Kazuya Yamamura, Osaka Univ. (Japan)
Yasuhisa Sano, Osaka Univ. (Japan)
Kazumasa Ueno, Osaka Univ. (Japan)
Katsuyoshi Endo, Osaka Univ. (Japan)
Yuzo Mori, Osaka Univ. (Japan)
Makina Yabashi, Japan Synchorotron Radiation Research Institute (Japan)
Kenji Tamasaku, RIKEN-The Institute of Physical and Chemical Research (Japan)
Yoshinori Nishino, RIKEN-The Institute of Physical and Chemical Research (Japan)
Tetsuya Ishikawa, Japan Synchorotron Radiation Research Institute (Japan)
RIKEN-The Institute of Physical and Chemical Research (Japan)
Kazuto Yamauchi, Osaka Univ. (Japan)


Published in SPIE Proceedings Vol. 5533:
Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II
Ali M. Khounsary; Udo Dinger; Kazuya Ota, Editor(s)

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