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Proceedings Paper

Second-order susceptibility measurement of thin films by reflective second harmonic generation method: toward measurement standards in nonlinear optics
Author(s): Costel Flueraru; Chander Prakash Grover
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Paper Abstract

There is a strong need for a simple and reliable characterization technique of nonlinear optical effects applicable to thin films. The second-order susceptibility is the parameter that plays a key role not only in SHG but also in cascading phenomena and optical bistabilities. The measurement methods of second-order susceptibility are divided into absolute and relative techniques. Relative measurements were performed to obtain the relative values of second-order susceptibility by comparison with a reference material, which is often crystalline quartz. There is a different approach for nonlinear optical characterization that depends on the type of sample: crystal or thin film. There are two methods used for second-order susceptibility measurement of thin films: a Maker fringe and reflective SHG. The Maker fringe is limited to the investigation of thin films on transparent substrates. Here we discuss an experimental protocol based on reflective SHG for nonlinear optical characterization of thin films. Since most measurements are performed relative to a reference material, the establishment of a well-accepted value for a standard material is important. The SHG in reflection of z-cut quartz is discussed in detail. The method is simple and reliable but limited to thin films. Measurements at different wavelengths and mapping will be reported.

Paper Details

Date Published: 20 December 2004
PDF: 10 pages
Proc. SPIE 5577, Photonics North 2004: Optical Components and Devices, (20 December 2004); doi: 10.1117/12.567494
Show Author Affiliations
Costel Flueraru, Institute of National Measurement Standards/NRC (Canada)
Chander Prakash Grover, Institute of National Measurement Standards/NRC (Canada)


Published in SPIE Proceedings Vol. 5577:
Photonics North 2004: Optical Components and Devices
John C. Armitage; Simon Fafard; Roger A. Lessard; George A. Lampropoulos, Editor(s)

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