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Improving the resolution of contact/proximity lithography using chemical shrink method
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Proc. SPIE 5592, Nanofabrication: Technologies, Devices, and Applications, ; doi: 10.1117/12.566752
Show Author Affiliations
Shyi Long Shy, National Nano Device Lab. (Taiwan)
Yung Chiang Ting, Far East College (Taiwan)


Published in SPIE Proceedings Vol. 5592:
Nanofabrication: Technologies, Devices, and Applications
Warren Y-C. Lai; Stanley Pau; O. Daniel Lopez, Editor(s)

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