Share Email Print
cover

Proceedings Paper

Oxidation of hydrogen silsesquioxane, (HSiO3/2)n, by rapid thermal processing
Author(s): Theresa E. Gentle
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Details

Date Published: 1 February 1992
PDF: 19 pages
Proc. SPIE 1595, Rapid Thermal and Integrated Processing, (1 February 1992); doi: 10.1117/12.56672
Show Author Affiliations
Theresa E. Gentle, Dow Corning Corp. (United States)


Published in SPIE Proceedings Vol. 1595:
Rapid Thermal and Integrated Processing
Mehrdad M. Moslehi; Rajendra Singh; Dim-Lee Kwong, Editor(s)

© SPIE. Terms of Use
Back to Top