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Proceedings Paper

Improved wafer temperature measurements
Author(s): David W. Voorhes; Deirdre M. Hall
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Paper Details

Date Published: 1 February 1992
PDF: 4 pages
Proc. SPIE 1595, Rapid Thermal and Integrated Processing, (1 February 1992); doi: 10.1117/12.56663
Show Author Affiliations
David W. Voorhes, OPTRA, Inc. (United States)
Deirdre M. Hall, OPTRA, Inc. (United States)

Published in SPIE Proceedings Vol. 1595:
Rapid Thermal and Integrated Processing
Mehrdad M. Moslehi; Rajendra Singh; Dim-Lee Kwong, Editor(s)

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