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Proceedings Paper

Wafer emissivity correction using dual-color pyrometry
Author(s): David Mordo; Yuval Wasserman; Arnon Gat
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Paper Details

Date Published: 1 February 1992
PDF: 9 pages
Proc. SPIE 1595, Rapid Thermal and Integrated Processing, (1 February 1992); doi: 10.1117/12.56662
Show Author Affiliations
David Mordo, AG Associates (United States)
Yuval Wasserman, AG Associates (United States)
Arnon Gat, AG Associates (United States)


Published in SPIE Proceedings Vol. 1595:
Rapid Thermal and Integrated Processing
Mehrdad M. Moslehi; Rajendra Singh; Dim-Lee Kwong, Editor(s)

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