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Proceedings Paper

Infrared diode laser and laser-induced fluorescence diagnostics of an electron cyclotron resonance plasma etching tool
Author(s): R. Claude Woods; R. L. McClain; L. J. Mahoney; E. A. Den Hartog; H. Persing; J. S. Hamers
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Paper Abstract

Two separate laser spectroscopic approaches have been used to investigate plasmas in the downstream region of a diverging field ECR etcher driven by a standard 1 kW ASTeX 2450 MHz source. Infrared absorption spectroscopy with a diode laser source and a multipass optical system has been used to monitor concentrations of CF2, CF3, and CF4 in pure CF4 or CHF3 or in mixtures of these with each other or with O2. These species concentrations, which in the cases of CF2 and CF4 are absolute, have been obtained as functions of both pressure and power. In the same tool details of the ion dynamics were studied using laser induced fluorescence (LIF) with a pulsed, etalon narrowed dye laser source, pumped by a nitrogen laser. Doppler limited line profiles of several rotational transitions of the (0-0) band of the B 2£+ — X 2E+ system of Nj were used to extract axial and transverse ion velocity distributions. Both pure nitrogen and nitrogen-helium mixtures were studied, and the transverse distributions were also obtained as a function of radial position. In the pressure region studied (0.5-4 mTorr) ion energies are generally much smaller than had been anticipated, a result we attribute to the major role played by collisions. We have also measured the translational temperature of neutral helium (by LIF) and the rotational temperature of Nj (by LIF and optical emission) for comparison purposes.

Paper Details

Date Published: 1 January 1992
PDF: 10 pages
Proc. SPIE 1594, Process Module Metrology, Control and Clustering, (1 January 1992); doi: 10.1117/12.56655
Show Author Affiliations
R. Claude Woods, Univ. of Wisconsin/Madison (United States)
R. L. McClain, Univ. of Wisconsin/Madison (United States)
L. J. Mahoney, Univ. of Wisconsin/Madison (United States)
E. A. Den Hartog, Univ. of Wisconsin/Madison (United States)
H. Persing, Univ. of Wisconsin/Madison (United States)
J. S. Hamers, Univ. of Wisconsin/Madison (United States)


Published in SPIE Proceedings Vol. 1594:
Process Module Metrology, Control and Clustering
Cecil J. Davis; Irving P. Herman; Terry R. Turner, Editor(s)

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