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Proceedings Paper

Application of optical emission diagnostics and control related to semiconductor processing
Author(s): Gregory Viloria; Richard N. Savage
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Paper Abstract

This paper will discuss and show applications of optical emission spectroscopy techniques and methods to monitor plasma emissions during semiconductor processing. A brief discussion of the instrumentation that was used and the software to control the instrumentation will also be presented. Optical emission spectroscopy techniques that will be discussed include chemical species identification in plasma etching, process fingerprinting, contamination detection, endpoint analysis/control and sputter/deposition plasma monitoring.

Paper Details

Date Published: 1 January 1992
PDF: 13 pages
Proc. SPIE 1594, Process Module Metrology, Control and Clustering, (1 January 1992); doi: 10.1117/12.56652
Show Author Affiliations
Gregory Viloria, SC Technology, Inc. (United States)
Richard N. Savage, SC Technology, Inc. (United States)


Published in SPIE Proceedings Vol. 1594:
Process Module Metrology, Control and Clustering
Cecil J. Davis; Irving P. Herman; Terry R. Turner, Editor(s)

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