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Proceedings Paper

Light scattering methods for semiconductor process monitoring and control
Author(s): Richard A. Gottscho; Matthew Vernon; Jeffrey A. Gregus; E. Yoon; K. P. Giapis; Todd R. Hayes; William S. Hobson; Lee M. Clark; J. Kruskal; Diane Lambert; Avi Kornblit; D. Sinatore
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Paper Details

Date Published: 1 January 1992
PDF: 7 pages
Proc. SPIE 1594, Process Module Metrology, Control and Clustering, (1 January 1992); doi: 10.1117/12.56644
Show Author Affiliations
Richard A. Gottscho, AT&T Bell Labs. (United States)
Matthew Vernon, Photronics (United States)
Jeffrey A. Gregus, AT&T Bell Labs. (United States)
E. Yoon, AT&T Bell Labs. (United States)
K. P. Giapis, AT&T Bell Labs. (United States)
Todd R. Hayes, AT&T Bell Labs. (United States)
William S. Hobson, AT&T Bell Labs. (United States)
Lee M. Clark, AT&T Bell Labs. (United States)
J. Kruskal, AT&T Bell Labs. (United States)
Diane Lambert, AT&T Bell Labs. (United States)
Avi Kornblit, AT&T Bell Labs. (United States)
D. Sinatore, AT&T Bell Labs. (United States)


Published in SPIE Proceedings Vol. 1594:
Process Module Metrology, Control and Clustering
Cecil J. Davis; Irving P. Herman; Terry R. Turner, Editor(s)

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