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Proceedings Paper

Adaptive photolithography control using development time manipulation
Author(s): Robert A. Soper; Duncan A. Mellichamp; Dale E. Seborg
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Paper Details

Date Published: 1 January 1992
PDF: 11 pages
Proc. SPIE 1594, Process Module Metrology, Control and Clustering, (1 January 1992); doi: 10.1117/12.56642
Show Author Affiliations
Robert A. Soper, Univ. of California/Santa Barbara (United States)
Duncan A. Mellichamp, Univ. of California/Santa Barbara (United States)
Dale E. Seborg, Univ. of California/Santa Barbara (United States)


Published in SPIE Proceedings Vol. 1594:
Process Module Metrology, Control and Clustering
Cecil J. Davis; Irving P. Herman; Terry R. Turner, Editor(s)

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