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Proceedings Paper

Application of adaptive equipment models to a photolithographic process
Author(s): Bart J. Bombay; Costas J. Spanos
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Paper Details

Date Published: 1 January 1992
PDF: 8 pages
Proc. SPIE 1594, Process Module Metrology, Control and Clustering, (1 January 1992); doi: 10.1117/12.56641
Show Author Affiliations
Bart J. Bombay, Univ. of California/Berkeley (United States)
Costas J. Spanos, Univ. of California/Berkeley (United States)


Published in SPIE Proceedings Vol. 1594:
Process Module Metrology, Control and Clustering
Cecil J. Davis; Irving P. Herman; Terry R. Turner, Editor(s)

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