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Proceedings Paper

Application of artificial neural networks to real-time control of plasma processes
Author(s): Daniel S. Camporese
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Paper Details

Date Published: 1 January 1992
PDF: 10 pages
Proc. SPIE 1594, Process Module Metrology, Control and Clustering, (1 January 1992); doi: 10.1117/12.56640
Show Author Affiliations
Daniel S. Camporese, Techware Systems Corp. (Canada)


Published in SPIE Proceedings Vol. 1594:
Process Module Metrology, Control and Clustering
Cecil J. Davis; Irving P. Herman; Terry R. Turner, Editor(s)

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