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Proceedings Paper

On-line process-model-based control of a plasma etcher
Author(s): Michael E. Parten; R. Russell Rhinehart; Vikram Singh
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Paper Details

Date Published: 1 January 1992
PDF: 9 pages
Proc. SPIE 1594, Process Module Metrology, Control and Clustering, (1 January 1992); doi: 10.1117/12.56639
Show Author Affiliations
Michael E. Parten, Texas Tech Univ. (United States)
R. Russell Rhinehart, Texas Tech Univ. (United States)
Vikram Singh, Texas Tech Univ. (United States)

Published in SPIE Proceedings Vol. 1594:
Process Module Metrology, Control and Clustering
Cecil J. Davis; Irving P. Herman; Terry R. Turner, Editor(s)

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