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Proceedings Paper

Open-loop predictive control of plasma etching of tungsten using an in-situ film thickness sensor
Author(s): Jerry A. Stefani; Keith J. Brankner; Rhett Barry Jucha; William T. Pu; Mark A. Graas
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Paper Details

Date Published: 1 January 1992
PDF: 15 pages
Proc. SPIE 1594, Process Module Metrology, Control and Clustering, (1 January 1992); doi: 10.1117/12.56638
Show Author Affiliations
Jerry A. Stefani, Texas Instruments Inc. (United States)
Keith J. Brankner, Texas Instruments Inc. (United States)
Rhett Barry Jucha, Texas Instruments Inc. (United States)
William T. Pu, Texas Instruments Inc. (United States)
Mark A. Graas, Texas Instruments Inc. (United States)


Published in SPIE Proceedings Vol. 1594:
Process Module Metrology, Control and Clustering
Cecil J. Davis; Irving P. Herman; Terry R. Turner, Editor(s)

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