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Proceedings Paper

Requirements and designs of illuminators for microlithography
Author(s): Paul Michaloski
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Paper Abstract

The beam shaping by illuminators of microlithographic optical systems is a key technological contributor to the advancement of mass production of integrated circuits. The following examines both the requirements and the design of these illumination systems. The importance of partial coherence, off-axis illumination, polarization, telecentricity and uniformity for the lithographic process are discussed. The design sections cover the systems from source to reticle, including the use of diffusers, axicons, kaleidoscopes and fly's eyes arrays.

Paper Details

Date Published: 29 September 2004
PDF: 10 pages
Proc. SPIE 5525, Laser Beam Shaping V, (29 September 2004); doi: 10.1117/12.563941
Show Author Affiliations
Paul Michaloski, Corning Tropel Corp. (United States)

Published in SPIE Proceedings Vol. 5525:
Laser Beam Shaping V
Fred M. Dickey; David L. Shealy, Editor(s)

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