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Proceedings Paper

Infrared emission of radio-frequency-excited (N2 + SiH4) discharge by high-resolution Fourier transform spectroscopy
Author(s): Mohammed Elhanine; Robert Farrenq; Guy Guelachvili
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Paper Abstract

Infrared emission of a gas mixture of N2 and SiH4 activated by radio frequency discharge has been analyzed using high resolution Fourier transform information. In addition to the several electronic bands of N2, signatures of three transient species--namely, NH, SiN and SiNH--have already been identified. For iminosilicon SiNH this is the first gas phase spectroscopic observation. Molecular parameters have been derived with a high accuracy. For nitride silicon, radical new A2$PI - X2(Sigma) bands have been observed. These data have been combined with other available information in order to improve molecular structure.

Paper Details

Date Published: 1 March 1992
PDF: 2 pages
Proc. SPIE 1575, 8th Intl Conf on Fourier Transform Spectroscopy, (1 March 1992); doi: 10.1117/12.56353
Show Author Affiliations
Mohammed Elhanine, Univ. de Paris-Sud (France)
Robert Farrenq, Univ. de Paris-Sud (France)
Guy Guelachvili, Univ. de Paris-Sud (France)

Published in SPIE Proceedings Vol. 1575:
8th Intl Conf on Fourier Transform Spectroscopy
Herbert Michael Heise; Ernst Heiner Korte; Heinz W. Siesler, Editor(s)

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