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Proceedings Paper

Low temperature metal deposition processes for optoelectronic devices
Author(s): Larry N. Lewis; Kevin H. Janora; Jie Liu; Shellie Gasaway; Eric P. Jacobson
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Paper Abstract

Photovoltaic cells require deposition of a platinum layer at the cathode to serve as a catalyst for reduction of redox carriers in PV cells. Current dye-sensitized solar cells (DSSC) employ high temperature decomposition of chloroplatinic acid to give platinum islands. In order to produce DSSCs with plastic substrates, a low temperature platinum deposition process was developed. Initial experiments showed that platinum was deposited if Karstedt platinum catalyst solution in hexamethyldisilazane (HMDZ) was coated onto a substrate followed by heating under 150°C. PV cell performance of Karstedt-HMDZ-containing platinum was inferior to cells made with high temperature platinum. However, CODPtMe2 (COD = 1,5-cyclooctadiene) was found to be a platinum precursor that led to PV cell performance equivalent to that obtained from high temperature platinum. Other precursors were evaluated as well including MeCpPtMe3 that permitted platinum deposition via UV irradiation. Kelvin Probe analysis was also performed on several platinum films prepared from a variety of precursors on several substrates under a variety of conditions. CPD values of < -0.6eV appeared to predict good PV cell performance. Further application of the low temperature-derived platinum films was made for organic light emitting diodes.

Paper Details

Date Published: 3 November 2004
PDF: 12 pages
Proc. SPIE 5520, Organic Photovoltaics V, (3 November 2004); doi: 10.1117/12.563522
Show Author Affiliations
Larry N. Lewis, GE Global Research (United States)
Kevin H. Janora, GE Global Research (United States)
Jie Liu, GE Global Research (United States)
Shellie Gasaway, GE Global Research (United States)
Eric P. Jacobson, GE Global Research (United States)


Published in SPIE Proceedings Vol. 5520:
Organic Photovoltaics V
Zakya H. Kafafi; Paul A. Lane, Editor(s)

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