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Proceedings Paper

Quantitative optical metrology with CMOS cameras
Author(s): Cosme Furlong; Ervin Kolenovic; Curtis F. Ferguson
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Paper Abstract

Recent advances in laser technology, optical sensing, and computer processing of data, have lead to the development of advanced quantitative optical metrology techniques for high accuracy measurements of absolute shapes and deformations of objects. These techniques provide noninvasive, remote, and full field of view information about the objects of interest. The information obtained relates to changes in shape and/or size of the objects, characterizes anomalies, and provides tools to enhance fabrication processes. Factors that influence selection and applicability of an optical technique include the required sensitivity, accuracy, and precision that are necessary for a particular application. In this paper, sensitivity, accuracy, and precision characteristics in quantitative optical metrology techniques, and specifically in optoelectronic holography (OEH) based on CMOS cameras, are discussed. Sensitivity, accuracy, and precision are investigated with the aid of National Institute of Standards and Technology (NIST) traceable gauges, demonstrating the applicability of CMOS cameras in quantitative optical metrology techniques. It is shown that the advanced nature of CMOS technology can be applied to challenging engineering applications, including the study of rapidly evolving phenomena occurring in MEMS and micromechatronics.

Paper Details

Date Published: 2 August 2004
PDF: 15 pages
Proc. SPIE 5532, Interferometry XII: Applications, (2 August 2004); doi: 10.1117/12.562788
Show Author Affiliations
Cosme Furlong, Worcester Polytechnic Institute (United States)
Ervin Kolenovic, Worcester Polytechnic Institute (United States)
Bremer Institut fur Angewandte Strahltechnik (Germany)
Curtis F. Ferguson, Worcester Polytechnic Institute (United States)


Published in SPIE Proceedings Vol. 5532:
Interferometry XII: Applications
Wolfgang Osten; Erik Novak, Editor(s)

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