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Proceedings Paper

Recent progress of EUV wavefront metrology in EUVA
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Paper Abstract

The recent experimental results of EUV wavefront metrology in EUVA are reported. EUV Experimental Interferometer (EEI) was built at the NewSUBARU synchrotron facility of University of Hyogo to develop the most suitable wavefront measuring method for EUV projection optics. The result is to be reflected on EWMS (EUV Wavefront Metrology System) that measures wavefront aberrations of a six-aspherical mirror projection optics of NA0.25, of a mass-production EUV lithography tool. The experimental results of Point Diffraction Interferometer (PDI) and Lateral Shearing Interferometer (LSI) are shown and the error factors and the sensitivity of astigmatism measurements of these methods are discussed. Furthermore, for reducing these kinds of errors, another type of shearing interferometer called DTI (Digital Talbot interferometer) is newly introduced.

Paper Details

Date Published: 18 October 2004
PDF: 10 pages
Proc. SPIE 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II, (18 October 2004); doi: 10.1117/12.562431
Show Author Affiliations
Masanobu Hasegawa, Extreme Ultraviolet Lithography System Development Association (Japan)
Chidane Ouchi, Extreme Ultraviolet Lithography System Development Association (Japan)
Takayuki Hasegawa, Extreme Ultraviolet Lithography System Development Association (Japan)
Seima Kato, Extreme Ultraviolet Lithography System Development Association (Japan)
Akinori Ohkubo, Extreme Ultraviolet Lithography System Development Association (Japan)
Akiyoshi Suzuki, Extreme Ultraviolet Lithography System Development Association (Japan)
Katsumi Sugisaki, Extreme Ultraviolet Lithography System Development Association (Japan)
Masashi Okada, Extreme Ultraviolet Lithography System Development Association (Japan)
Katsura Otaki, Extreme Ultraviolet Lithography System Development Association (Japan)
Katsuhiko Murakami, Extreme Ultraviolet Lithography System Development Association (Japan)
Jun Saito, Extreme Ultraviolet Lithography System Development Association (Japan)
Masahito Niibe, Univ. of Hyogo (Japan)
Mitsuo Takeda, Univ. of Electrocommunications (Japan)


Published in SPIE Proceedings Vol. 5533:
Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II
Ali M. Khounsary; Udo Dinger; Kazuya Ota, Editor(s)

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