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Proceedings Paper

Laser sample stage-based image resolution enhancement method for SEMs
Author(s): András E. Vladar; Eranga C. Jayewardene; Bradley N. Damazo; William J. Keery; Michael T. Postek
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Paper Abstract

The development of a very fast, very accurate laser stage measurement system facilitates a new method to enhance the image and line scan resolution of scanning electron microscopes (SEMs). This method, allows for fast signal intensity and displacement measurements, and can report hundreds of thousands of measurement points in just a few seconds. It is possible then, to account for the stage position in almost real time with a resolution of 0.2 nm. The extent and direction of the stage motion reveal important characteristics of the stage vibration and drift, and helps to minimize them. The high accuracy and speed also allows for a convenient and effective technique for diminishing these problems by correlating instantaneous position and imaging intensity. The new measurement technique gives a possibility for significantly improving SEM-based dimensional measurement quality.

Paper Details

Date Published: 24 May 2004
PDF: 7 pages
Proc. SPIE 5375, Metrology, Inspection, and Process Control for Microlithography XVIII, (24 May 2004); doi: 10.1117/12.562367
Show Author Affiliations
András E. Vladar, National Institute of Standards and Technology (United States)
Eranga C. Jayewardene, National Institute of Standards and Technology (United States)
Bradley N. Damazo, National Institute of Standards and Technology (United States)
William J. Keery, National Institute of Standards and Technology (United States)
Michael T. Postek, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 5375:
Metrology, Inspection, and Process Control for Microlithography XVIII
Richard M. Silver, Editor(s)

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