Share Email Print
cover

Proceedings Paper

Fabrication of aspherical mirrors for HiNA (high numerical aperture EUV exposure tool) set-3 projection optics
Author(s): Tetsuya Oshino; Takahiro Yamamoto; Tatsuro Miyoshi; Masayuki Shiraishi; Takaharu Komiya; Noriaki Kandaka; Hiroyuki Kondo; Kiyoto Mashima; Kazushi Nomura; Katsuhiko Murakami; Hiroaki Oizumi; Isa Nishiyama; Shinji Okazaki
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Aspherical mirror fabrication of HiNA set-3 projection optics was completed. By using a new polishing method, we successfully reduced low spatial frequency roughness (LSFR), mid spatial frequency roughness (MSFR) and high spatial frequency roughness (HSFR) compared with HiNA set-1 and set-2 projection optics. MSFR, which strongly affects the flare of the optics, was remarkably reduced to less than 0.2nm rms. HiNA projection optical system with the numerical aperture of 0.3 consists of two aspheric mirrors (M1 and M2). We had already fabricated two sets of the HiNA projection optics. The wavefront error (WFE) of the set-1 optics was 7.5nm rms and that of the set-2 optics was 1.9nm rms. We tried to reduce the WFE and flare in the set-3 optics. The target number of WFE of the set-3 optics was less than 1nm rms. The LSFR, MSFR and HSFR of the M1 of the set-3 optics were 0.25nm rms, 0.17nm rms and 0.10nm rms, respectively. The LSFR and MSFR are almost half values compared with those of the M1 for the set-2 optics. The HSFR was also reduced from 0.13nm rms (set-2) to 0.10nm rms (set-3). The LSFR and MSFR of the M2 were 0.25nm rms and 0.20nm rms, respectively. The estimated wavefront error calculated from these LSFR numbers is 0.7nm rms.

Paper Details

Date Published: 20 May 2004
PDF: 9 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.562365
Show Author Affiliations
Tetsuya Oshino, Nikon Corp. (Japan)
Takahiro Yamamoto, Nikon Corp. (Japan)
Tatsuro Miyoshi, Nikon Corp. (Japan)
Masayuki Shiraishi, Nikon Corp. (Japan)
Takaharu Komiya, Nikon Corp. (Japan)
Noriaki Kandaka, Nikon Corp. (Japan)
Hiroyuki Kondo, Nikon Corp. (Japan)
Kiyoto Mashima, Nikon Corp. (Japan)
Kazushi Nomura, Nikon Corp. (Japan)
Katsuhiko Murakami, Nikon Corp. (Japan)
Hiroaki Oizumi, Association of Super-Advanced Electronics Technologies (Japan)
Isa Nishiyama, Association of Super-Advanced Electronics Technologies (Japan)
Shinji Okazaki, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

© SPIE. Terms of Use
Back to Top