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Proceedings Paper

Optimization and analysis of depth-graded multilayer structures
Author(s): David M. Broadway; Yuriy Y. Platonov; Vladimir V. Martynov; Pao-Kuang Kuo
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Paper Abstract

We introduce a method for the determination of the thickness variation through the stack of multilayer structures deposited by magnetron sputter deposition. The deposited structure is determined by minimizing a merit function based on the difference between actual x-ray reflectivity data and the theoretical calculation of the reflectivity from a multilayer structure. This method uses only four parameters and is independent of the total number of layers deposited. Further, this simple method provides a good initial guess if one wishes to increase the number of independent parameters in order to investigate finer detail of the structure. We illustrate the usefulness of this method through comparison of a desired and deposited Ni/C multilayer. The thickness distribution through the stack was designed in such a way as to maximize integrated reflectivity over some angular range. Finally, we determine the dependence of layer thickness with annealing temperature for the depth graded Ni/C multilayer by use of our method.

Paper Details

Date Published: 3 November 2004
PDF: 11 pages
Proc. SPIE 5537, X-Ray Sources and Optics, (3 November 2004); doi: 10.1117/12.561446
Show Author Affiliations
David M. Broadway, Osmic, Inc. (United States)
Wayne State Univ. (United States)
Yuriy Y. Platonov, Osmic, Inc. (United States)
Vladimir V. Martynov, Osmic, Inc. (United States)
Pao-Kuang Kuo, Wayne State Univ. (United States)


Published in SPIE Proceedings Vol. 5537:
X-Ray Sources and Optics
Carolyn A. MacDonald; Albert T. Macrander; Tetsuya Ishikawa; Christian Morawe; James L. Wood, Editor(s)

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