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Proceedings Paper

Subatomic accuracy in EUVL multilayer coatings
Author(s): Erwin Zoethout; P. Suter; R. W.E. van de Kruijs; Andrey E. Yakshin; Eric Louis; Fred Bijkerk; H. Enkisch; Stefan Muellender
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Paper Abstract

Reported is the production of multilayer EUV coatings on 25000 mm2 large mirror substrates using e-beam based deposition. The accuracy achieved over the full area and the full multilayer stack amounts to an added figure error of 0.02 nm, i.e. in the sub-atomic distance range, thus meeting the future requirements on EUV coating technology.

Paper Details

Date Published: 20 May 2004
PDF: 5 pages
Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); doi: 10.1117/12.561319
Show Author Affiliations
Erwin Zoethout, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
P. Suter, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
R. W.E. van de Kruijs, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Andrey E. Yakshin, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Eric Louis, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Fred Bijkerk, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
H. Enkisch, Carl Zeiss SMT AG (Germany)
Stefan Muellender, Carl Zeiss SMT AG (Germany)


Published in SPIE Proceedings Vol. 5374:
Emerging Lithographic Technologies VIII
R. Scott Mackay, Editor(s)

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