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Proceedings Paper

Conformal mapping in microlithography
Author(s): Asher Klatchko; Peter Pirogovsky
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Paper Abstract

We show that a conformal mapping of the type, W = z π/α, describes how a shape of a 45° rotated cross transforms into a contact hole. We discuss its relevance to corner rounding seen on raster beam pattern generators.

Paper Details

Date Published: 6 December 2004
PDF: 10 pages
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.561106
Show Author Affiliations
Asher Klatchko, Etec Systems, Inc., an Applied Materials Co. (United States)
Peter Pirogovsky, Etec Systems, Inc., an Applied Materials Co. (United States)


Published in SPIE Proceedings Vol. 5567:
24th Annual BACUS Symposium on Photomask Technology
Wolfgang Staud; J. Tracy Weed, Editor(s)

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