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Proceedings Paper

Advances in the use of plasma spraying for the fabrication of lightweight x-ray optics
Author(s): Melville P. Ulmer; Michael Edward Graham; Semyon Vaynman; Matvey Farber; Jonathan I. Echt; Steve J. Varlese; Gary Emerson; Dean Baker
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Paper Abstract

The next generation of X-ray observatories requires large area optics, with optimal angular resolution, minimal mass, and affordable fabrication techniques. Furthermore, for survey applications, a Ritchey-Chretien or polynomial design is called for, which precludes the use of foil or glass segment cone approximations. In order to meet these requirements, we have been exploring the use of plasma spraying as a replication technology to improve shape control and stiffness with a minimal mass penalty. Our main improvements to the basic concept is the lamination of the sprayed material with electroformed Ni on the outer surface along with the electroformed Ni inner surface of the mirror. We have also used metal-coated ceramic micro-spheres for the sprayed material and controlled the substrate temperature during spraying. These enhancements show the promise of making the technology viable. An up-to-date characterization of the properties of test pieces are presented.

Paper Details

Date Published: 18 October 2004
PDF: 6 pages
Proc. SPIE 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II, (18 October 2004); doi: 10.1117/12.560421
Show Author Affiliations
Melville P. Ulmer, Northwestern Univ. (United States)
Michael Edward Graham, Northwestern Univ. (United States)
Semyon Vaynman, Northwestern Univ. (United States)
Matvey Farber, Northwestern Univ. (United States)
Jonathan I. Echt, Northwestern Univ. (United States)
Steve J. Varlese, Ball Aerospace & Technologies Corp. (United States)
Gary Emerson, Ball Aerospace & Technologies Corp. (United States)
Dean Baker, Advanced Powder Solutions (United States)


Published in SPIE Proceedings Vol. 5533:
Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II
Ali M. Khounsary; Udo Dinger; Kazuya Ota, Editor(s)

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