Share Email Print
cover

Proceedings Paper

Short-wavelength ablation of solids: pulse duration and wavelength effects
Author(s): Libor Juha; Michal Bittner; Dagmar Chvostova; Vit Letal; Josef Krasa; Zdenek Otcenasek; Michaela Kozlova; Jiri Polan; Ansgar R. Prag; Bedrich Rus; Michal Stupka; Jacek Krzywinski; Andrzej Andrejczuk; Jerzy B. Pelka; Ryszard H. Sobierajski; Leszek Ryc; Josef Feldhaus; Frederick P. Boody; Henryk Fiedorowicz; Andrzej Bartnik; Janusz Mikolajczyk; Rafal Rakowski; P. Kubat; Ladislav Pina; Michael E. Grisham; Georgiy O. Vaschenko; Carmen S. Menoni; Jorge J. G. Rocca
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

For conventional wavelength (UV-Vis-IR) lasers delivering radiation energy to the surface of materials, ablation thresholds, ablation (etch) rates, and the quality of ablated structures often differ dramatically between short (typically nanosecond) and ultrashort (typically femtosecond) pulses. Various short-wavelength (l < 100 nm) lasers emitting pulses with durations ranging from ~ 10 fs to ~ 1 ns have recently been put into a routine operation. This makes it possible to investigate how the ablation characteristics depend on the pulse duration in the XUV spectral region. 1.2-ns pulses of 46.9-nm radiation delivered from a capillary-discharge Ne-like Ar laser (Colorado State University, Fort Collins), focused by a spherical Sc/Si multilayer-coated mirror were used for an ablation of organic polymers and silicon. Various materials were irradiated with ellipsoidal-mirror-focused XUV radiation (λ = 86 nm, τ = 30-100 fs) generated by the free-electron laser (FEL) operated at the TESLA Test Facility (TTF1 FEL) in Hamburg. The beam of the Ne-like Zn XUV laser (λ = 21.2 nm, τ < 100 ps) driven by the Prague Asterix Laser System (PALS) was also successfully focused by a spherical Si/Mo multilayer-coated mirror to ablate various materials. Based on the results of the experiments, the etch rates for three different pulse durations are compared using the XUV-ABLATOR code to compensate for the wavelength difference. Comparing the values of etch rates calculated for short pulses with those measured for ultrashort pulses, we can study the influence of pulse duration on XUV ablation efficiency. Ablation efficiencies measured with short pulses at various wavelengths (i.e. 86/46.9/21.2 nm from the above-mentioned lasers and ~ 1 nm from the double stream gas-puff Xe plasma source driven by PALS) show that the wavelength influences the etch rate mainly through the different attenuation lengths.

Paper Details

Date Published: 10 November 2004
PDF: 13 pages
Proc. SPIE 5534, Fourth Generation X-Ray Sources and Optics II, (10 November 2004); doi: 10.1117/12.560413
Show Author Affiliations
Libor Juha, Institute of Physics (Czech Republic)
Michal Bittner, Institute of Physics (Czech Republic)
Charles Univ. (Czech Republic)
Dagmar Chvostova, Institute of Physics (Czech Republic)
Vit Letal, Czech Technical Univ. (Czech Republic)
Josef Krasa, Institute of Physics (Czech Republic)
Zdenek Otcenasek, Institute of Physics (Czech Republic)
Czech Technical Univ. (Czech Republic)
Michaela Kozlova, Institute of Physics (Czech Republic)
Jiri Polan, Institute of Physics (Czech Republic)
Ansgar R. Prag, Institute of Physics (Czech Republic)
Bedrich Rus, Institute of Physics (Czech Republic)
Michal Stupka, Institute of Physics (Czech Republic)
Jacek Krzywinski, HASYLAB/DESY (Germany)
Institute of Physics (Poland)
Andrzej Andrejczuk, HASYLAB/DESY (Germany)
Univ. of Bialystok (Poland)
Jerzy B. Pelka, HASYLAB/DESY (Germany)
Institute of Physics (Poland)
Ryszard H. Sobierajski, Warsaw Univ. of Technology (Poland)
Leszek Ryc, Institute of Plasma Physics and Laser Microfusion (Poland)
Josef Feldhaus, HASYLAB/DESY (Germany)
Frederick P. Boody, Ion Light Technologies GmbH (Germany)
Henryk Fiedorowicz, Military Univ. of Technology (Poland)
Andrzej Bartnik, Military Univ. of Technology (Poland)
Janusz Mikolajczyk, Military Univ. of Technology (Poland)
Rafal Rakowski, Military Univ. of Technology (Poland)
P. Kubat, J. Heyrovsky Institute of Physics (Czech Republic)
Ladislav Pina, Czech Technical Univ. (Czech Republic)
Michael E. Grisham, Colorado State Univ. (United States)
Georgiy O. Vaschenko, Colorado State Univ. (United States)
Carmen S. Menoni, Colorado State Univ. (United States)
Jorge J. G. Rocca, Colorado State Univ. (United States)


Published in SPIE Proceedings Vol. 5534:
Fourth Generation X-Ray Sources and Optics II
Sandra G. Biedron; Wolfgang Eberhardt; Tetsuya Ishikawa; Roman O. Tatchyn, Editor(s)

© SPIE. Terms of Use
Back to Top