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Proceedings Paper

High-aspect ratio grating fabrication by imprint lithography
Author(s): Yoshihiko Hirai; Takaaki Konishi; Tomohiro Kanakugi; Hiroaki Kawata; Hisao Kikuta
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Paper Abstract

A fine grating with high aspect rate pattern is one of the essential elements for advanced nano optical devices such as a quarter wave plate. To fabricate high aspect ratio pattern having sub wavelength feature size, nanoimprint lithography is applied. However, fatal defects caused by mechanical stress and friction between the mold and polymer are significant problems. To eliminate the defects, the process sequence, pressure and temperature conditions are optimized. Using Si based mold, sub wavelength grating having 200nm in width and over 1.7 micron in height is demonstrated using PMMA thin film on quartz substrate. This method is a promising technology for industrial production of advanced nano optical elements having high aspect ratio structure.

Paper Details

Date Published: 8 October 2004
PDF: 8 pages
Proc. SPIE 5515, Nanoengineering: Fabrication, Properties, Optics, and Devices, (8 October 2004); doi: 10.1117/12.560249
Show Author Affiliations
Yoshihiko Hirai, Osaka Prefecture Univ. (Japan)
Takaaki Konishi, Osaka Prefecture Univ. (Japan)
Tomohiro Kanakugi, Osaka Prefecture Univ. (Japan)
Hiroaki Kawata, Osaka Prefecture Univ. (Japan)
Hisao Kikuta, Osaka Prefecture Univ. (Japan)


Published in SPIE Proceedings Vol. 5515:
Nanoengineering: Fabrication, Properties, Optics, and Devices
Elizabeth A. Dobisz; Louay A. Eldada, Editor(s)

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