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Proceedings Paper

Present state of the art in undulator technology
Author(s): Steve C. Gottschalk
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Paper Abstract

We summarize the technology status of undulators suitable for Vacuum Ultraviolet (VUV) sources. Planar, biharmonic, multi-harmonic and elliptically polarized undulator designs and performance will be reviewed. The present state of the art in virtual prototyping, manufacturing and tuning will also be discussed.

Paper Details

Date Published: 10 November 2004
PDF: 14 pages
Proc. SPIE 5534, Fourth Generation X-Ray Sources and Optics II, (10 November 2004); doi: 10.1117/12.560076
Show Author Affiliations
Steve C. Gottschalk, STI Optronics, Inc. (United States)

Published in SPIE Proceedings Vol. 5534:
Fourth Generation X-Ray Sources and Optics II
Sandra G. Biedron; Wolfgang Eberhardt; Tetsuya Ishikawa; Roman O. Tatchyn, Editor(s)

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