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Proceedings Paper

Wavefront aberration measurement technology for microlens using the Mach-Zehnder interferometer provided with a projected aperture
Author(s): Takaaki Miyashita; Kenjiro Hamanaka; Masahiko Kato; Satoshi Ishihara; Hiroyasu Sato; Eiichi Sato; Tadashi Morokuma
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Paper Abstract

We have carried out wavefront aberration measurement with the reduction projection of an aperture on the pupil of the test microlens set in the interferometer optics. The size of the image of the aperture determines the effective aperture of the microlens, and proposes aperture restriction methods to reduce the influence of the Fresnel diffraction. Wavefront aberrations were measured and evaluated by the use of phase shift method applied to the Mach-Zehnder interferometer. We studied if we can form an image of an aperture stop on the pupil plane of the test microlens. The evaluation of the effect of the aperture on the fringe quality was evaluated through the prototype equipment using the microlens of less than 30 micrometers in diameter. In this paper, we describe the method of reducing the measurement error of wavefront aberration using the effective diameter of the microlens.

Paper Details

Date Published: 2 August 2004
PDF: 11 pages
Proc. SPIE 5532, Interferometry XII: Applications, (2 August 2004); doi: 10.1117/12.559872
Show Author Affiliations
Takaaki Miyashita, Ricoh Co., Ltd. (Japan)
Kenjiro Hamanaka, Nippon Sheet Glass Co., Ltd. (Japan)
Masahiko Kato, Consultant (Japan)
Satoshi Ishihara, OITDA (Japan)
Hiroyasu Sato, Opto Design, Inc. (Japan)
Eiichi Sato, Opto Design, Inc. (Japan)
Tadashi Morokuma, Tokai Univ. (Japan)

Published in SPIE Proceedings Vol. 5532:
Interferometry XII: Applications
Wolfgang Osten; Erik Novak, Editor(s)

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