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Proceedings Paper

Ion-assist applications of broad-beam ion sources
Author(s): Harold R. Kaufman; James M.E. Harper
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Paper Abstract

Ion-assist applications of broad-beam ion sources are reviewed for ion energies up to about 1 keV. These applications are organized by ion energy and cover a wide range of thin-film technologies. Optimum ion-assist doses are described when available. Except for applications that benefit from specific ion energies, the majority of ion-assist applications are probably done best in the low-energy range that extends from about 25 eV to 100 eV.

Paper Details

Date Published: 29 September 2004
PDF: 19 pages
Proc. SPIE 5527, Advances in Thin Film Coatings for Optical Applications, (29 September 2004); doi: 10.1117/12.559785
Show Author Affiliations
Harold R. Kaufman, Kaufman and Robinson, Inc. (United States)
James M.E. Harper, Univ. of New Hampshire (United States)


Published in SPIE Proceedings Vol. 5527:
Advances in Thin Film Coatings for Optical Applications
Jennifer D. T. Kruschwitz; James B. Oliver, Editor(s)

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