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Proceedings Paper

Design and development of an optical system for EUV-microscopy
Author(s): Thomas Foltyn; Klaus Bergmann; Stefan Braun; Peter Gawlitza; Andreas Leson; Willy Neff; Konstantin Walter
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Paper Abstract

In the paper we describe the development of a reflective optical system for EUV-microscopy containing an ellipsoidal formed collector optics and a Schwarzschild objective (magnification M=21, numerical aperture NA=0.2) for EUV radiation of a wavelength λ=13.5nm. In order to collect the maximum intensity of an EUV gas discharge plasma source, the grazing incidence collector has been inside-coated with molybdenum by Pulsed Laser Deposition (PLD). This method enables the deposition of uniform and highly reflective molybdenum layers, which have been protected against oxydation by using thin carbon top layers. The two mirrors of the Schwarzschild objective consist of highly reflective Mo/Si- multilayers produced by Magnetron Sputter Deposition (MSD). In order to obtain the best optical performance, laterally graded multilayers with rotational symmetry have been deposited by using a new mask-deposition technique. Thus the multilayer thickness corresponds at each point of the curved mirrors to wavelength and incidence angle of the EUV beam. Ray tracing simulations were performed for the two optical elements, collector optics and Schwarzschild objective. The results of these calculations are shown and compared with the results obtained by the EUV-microscope.

Paper Details

Date Published: 18 October 2004
PDF: 10 pages
Proc. SPIE 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II, (18 October 2004); doi: 10.1117/12.559675
Show Author Affiliations
Thomas Foltyn, Fraunhofer-Institut fur Werkstoff- und Strahltechnik (Germany)
Klaus Bergmann, Fraunhofer-Institut fur Lasertechnik (Germany)
Stefan Braun, Fraunhofer-Institut fur Werkstoff- und Strahltechnik (Germany)
Peter Gawlitza, Fraunhofer-Institut fur Werkstoff- und Strahltechnik (Germany)
Andreas Leson, Fraunhofer-Institut fur Werkstoff- und Strahltechnik (Germany)
Willy Neff, Fraunhofer-Institut fur Lasertechnik (Germany)
Konstantin Walter, Fraunhofer-Institut fur Lasertechnik (Germany)


Published in SPIE Proceedings Vol. 5533:
Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II
Ali M. Khounsary; Udo Dinger; Kazuya Ota, Editor(s)

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