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Proceedings Paper

Determination of optical properties of titanium dioxide thin films on different substrates by using spectroscopic ellipsometry
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Paper Abstract

We investigated the optical properties of titanium dioxide (TiO2) thin films which were deposited by ion beam assisted deposition (IAD) method on crystalline silicon and acrylic substrates. TiO2 thin films were grown by different growing conditions which are used the conditions of vacuum pressure, and deposition rate. The controlled vacuum pressure were 3 x 10-5Torr and 3 x 10-6 Torr, and the deposition rate was controlled to 0.35 nm/second, 0.20 nm/second, and 0.12 nm/second. Measurements of spectroscopic ellipsometry were performed in the spectral range between 0.76 eV and 8.7 eV with 0.02 eV steps and at the angle of incidence of 75°. We determined the complex refractive index and thickness of TiO2 thin films using the optical model which is included the Tauc-Lorentz dispersion equation and compared the relations between the optical properties and deposition rate or vacuum pressure variation. The optical band gaps of TiO2 thin films are around 3.42 eV.

Paper Details

Date Published: 14 October 2004
PDF: 7 pages
Proc. SPIE 5538, Optical Constants of Materials for UV to X-Ray Wavelengths, (14 October 2004); doi: 10.1117/12.559427
Show Author Affiliations
Hyun Jong Kim, Korea Research Institute of Standards and Science (South Korea)
Yong Jai Cho, Korea Research Institute of Standards and Science (South Korea)
Hyun Mo Cho, Korea Research Institute of Standards and Science (South Korea)
Won Chegal, Korea Research Institute of Standards and Science (South Korea)
Yun Woo Lee, Korea Research Institute of Standards and Science (South Korea)
Sang Youl Kim, Ajou Univ. (South Korea)


Published in SPIE Proceedings Vol. 5538:
Optical Constants of Materials for UV to X-Ray Wavelengths
Regina Soufli; John F. Seely, Editor(s)

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