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Proceedings Paper

9-(2-ethylhexyl)carbazole for carrier transport and photorefractive materials
Author(s): Tetsuya Aoyama; Jean-Charles Ribierre; Takafumi Sassa; Takashi Kobayashi; Tsuyoshi Muto; Tatsuo Wada
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Paper Abstract

We investigated the carrier transport and photorefractive properties in multi-component materials containing 9-(2-ethylhexyl)carbazole (EHCz), so-called liquid carbazole. The electric-field dependence of the carrier mobility for EHCz and polyvinylcarbazole (PVK) was measured by the time-of-flight (TOF) technique. We obtained the higher carrier mobility of 4.2 x 10-6 cm2/Vs with an electric field of 2.5 x 105 V/cm for EHCz than that of 6.4 x 10-7 cm2/Vs for PVK. We also performed the two-beam coupling (TBC) technique to investigate photorefractive responses for the guest-host polymers containing PVK, EHCz, the electro-optic chromophore 4-piperidinobenzylidene malonitrile (PDCST), and the sensitizer C60. The measurement showed that the TBC gain depended on the mixture ratio of PVK and EHCz. The TBC gain was enhanced from 31 to 85 cm-1 at an electric field of 60 V/μm by increasing the concentration of EHCz from 10 to 15 wt%. These results show that EHCz plays important role for the optoelectronic and photorefractive materials as a hole transport materials as well as a plasticizer.

Paper Details

Date Published: 26 October 2004
PDF: 8 pages
Proc. SPIE 5521, Organic Holographic Materials and Applications II, (26 October 2004); doi: 10.1117/12.559242
Show Author Affiliations
Tetsuya Aoyama, RIKEN, The Institute of Physical and Chemical Research (Japan)
Jean-Charles Ribierre, RIKEN, The Institute of Physical and Chemical Research (Japan)
Takafumi Sassa, RIKEN, The Institute of Physical and Chemical Research (Japan)
Takashi Kobayashi, RIKEN, The Institute of Physical and Chemical Research (Japan)
Tsuyoshi Muto, RIKEN, The Institute of Physical and Chemical Research (Japan)
Tatsuo Wada, RIKEN, The Institute of Physical and Chemical Research (Japan)


Published in SPIE Proceedings Vol. 5521:
Organic Holographic Materials and Applications II
Klaus Meerholz, Editor(s)

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