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Proceedings Paper

High spectral resolution Al2O3/B4C, SiC/Si, SiC/B4C, and SiC/C multilayer structures for the photon energies of 6 keV to 19 keV
Author(s): Yuriy Y. Platonov; Vladimir V. Martynov; Alexander Kazimirov; Barry Lai
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Paper Abstract

A double multilayer monochromator with each multilayer composed of four stripes with different d-spacing providing spectral resolution of 0.3% to 0.8% in the energy range of 6keV to 19keV has been developed. Test multilayer structures with d-spacing from 2.3nm to 10.6nm have been deposited by magnetron sputtering. X-ray characterization has been performed at OSMIC by using a recently upgraded diffractometer setup and Cu-Kα radiation and at the APS. The following material combinations were studied before the final choice of materials for the high energy resolution monochromator has been made: Al2O3/B4C, SiC/Si, SiC/B4C and SiC/C. To minimize the effect of internal stress built in multilayer structure on X-ray characteristics flat and thick 1" diameter silicon substrates supplied by Wave Precision Inc. were used for all calibration coatings. Final coatings were deposited on two 145mm long, 60mm wide and 30mm thick silicon substrates. Resolution of SiC/Si structures with d1=2.3nm, N1=1000 and d2=3nm, N2=700 was measured at Cu-Kα with X-ray beam divergence of 14 arcsec to be 0.216% and 0.34% respectively. For plane waves the resolution is expected to be 0.13% and 0.19%, respectively.

Paper Details

Date Published: 3 November 2004
PDF: 10 pages
Proc. SPIE 5537, X-Ray Sources and Optics, (3 November 2004); doi: 10.1117/12.558740
Show Author Affiliations
Yuriy Y. Platonov, Osmic, Inc. (United States)
Vladimir V. Martynov, Osmic, Inc. (United States)
Alexander Kazimirov, Cornell Univ. (United States)
Barry Lai, Argonne National Lab. (United States)

Published in SPIE Proceedings Vol. 5537:
X-Ray Sources and Optics
Carolyn A. MacDonald; Albert T. Macrander; Tetsuya Ishikawa; Christian Morawe; James L. Wood, Editor(s)

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