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Proceedings Paper

Emission spectra of laser-produced plasmas for EUV and soft x-ray sources
Author(s): Georg Soumagne; Tamotsu Abe; Kenichi Ikeda; Hiroshi Komori; Hiroshi Someya; Takashi Suganuma; Kazuhisa Nakajima; Akira Endo
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Paper Abstract

The plasma emission of tin, aluminum and cupper targets irradiated with laser intensities ranging from 1011 to 1016 W/cm2 has been measured beween 7nm and 18 nm. A chirped pulse amplified Ti:Sapphire laser oscillating at 790- nm with either 100 fs or 300 ps pulse duration and a Nd:YAG laser oscillating at 1064 nm with 10 ns pulse duration (fwhm) have been used. The observed plasma emission was strongest for the 300 ps laser pulse irradiation, which might be due to the additional laser plasma heating during plasma formation.

Paper Details

Date Published: 10 June 2004
PDF: 6 pages
Proc. SPIE 5482, Laser Optics 2003: Superintense Light Fields and Ultrafast Processes, (10 June 2004); doi: 10.1117/12.558598
Show Author Affiliations
Georg Soumagne, Extreme Ultraviolet Lithography System Development Association (Japan)
Tamotsu Abe, Extreme Ultraviolet Lithography System Development Association (Japan)
Kenichi Ikeda, Graduate Univ. for Advanced Studies (Japan)
Hiroshi Komori, Extreme Ultraviolet Lithography System Development Association (Japan)
Hiroshi Someya, Extreme Ultraviolet Lithography System Development Association (Japan)
Takashi Suganuma, Extreme Ultraviolet Lithography System Development Association (Japan)
Kazuhisa Nakajima, Graduate Univ. for Advanced Studies (Japan)
High Energy Accelerator Research Organization (Japan)
Akira Endo, Extreme Ultraviolet Lithography System Development Association (Japan)


Published in SPIE Proceedings Vol. 5482:
Laser Optics 2003: Superintense Light Fields and Ultrafast Processes
Vladimir E. Yashin; Alexandr A. Andreev, Editor(s)

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