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Proceedings Paper

Feedforward correction of mask image placement for proximity electron lithography
Author(s): Shinji Omori; Shinichiro Nohdo; Tomonori Motohashi; Tetsuya Kitagawa; Takashi Susa; Kenta Yotsui; Kojiro Itoh; Akira Tamura
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Paper Abstract

A production-compatible method for the correction of image-placement (IP) error over a 1x stencil mask as used for proximity electron lithography (PEL) has been demonstrated. The mask IP error as measured using a newly developed metrology tool was fed forward to the PEL stepper, LEEPL-3000 and corrected for via the fine deflection of the electron beam. The overlay errors with respect to the substrate patterned by the ArF scanner have decreased from 63.6/59.3 nm to 26.1/36.4 nm in the x/y directions, but they are still larger than the errors of 15.2/14.8 nm for the conventional feedback method. Therefore, some improvements in the metrology method, the mask chucking method, the mask flatness and so on are required.

Paper Details

Date Published: 20 August 2004
PDF: 9 pages
Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); doi: 10.1117/12.557821
Show Author Affiliations
Shinji Omori, Sony Corp. (Japan)
Shinichiro Nohdo, Sony Corp. (Japan)
Tomonori Motohashi, Sony Corp. (Japan)
Tetsuya Kitagawa, Sony Corp. (Japan)
Takashi Susa, Toppan Printing Co., Ltd. (Japan)
Kenta Yotsui, Toppan Printing Co., Ltd. (Japan)
Kojiro Itoh, Toppan Printing Co., Ltd. (Japan)
Akira Tamura, Toppan Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 5446:
Photomask and Next-Generation Lithography Mask Technology XI
Hiroyoshi Tanabe, Editor(s)

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