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Proceedings Paper

Proximity-effect correction software for EPL using the pattern classify method
Author(s): Shigeki Mori; Akio Sato; Kyoji Nakajo; Masanori Shoji; Naomi Shimada; Hirokazu Sambayashi; Kenzo Goto; Fumio Murai; Hiroshi Fukuda
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Paper Abstract

In electron projection lithography (EPL), a proximity-effect was the most significant problem to critical dimension (CD) control. It was remarkable, especially when beam blur was as large as the minimum pattern size. We have developed proximity-effect correction software for EPL to solve this problem. First, this software made a correction table automatically. In this table, the optimum biases were given for various backward-scattering energy levels and beam blurs regarding all kinds of model patterns. Next, every pattern edge was classified in any of the model patterns. Then, the bias for each edge was determined taking certain proportion between the correction table bias and the previous bias. After that, pattern shape was modified. Those processes were iterated until every change in bias was less than 0.5 nm. Finally, stitching pattern features were added. This software was tested using actual 70-nm rule chip data. Errors in energy level for various kinds of patterns were better than 3 percent and line end shortening was successfully corrected. Data size expansion after the correction was about 10 percent. Processing time was about 10 hours on six PCs cluster system. In conclusion, this software provides enough CD uniformity and pattern fidelity for EPL practically. In addition, this software is applicable to not only EPL but also to EB-direct writing.

Paper Details

Date Published: 20 August 2004
PDF: 9 pages
Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); doi: 10.1117/12.557820
Show Author Affiliations
Shigeki Mori, Hitachi ULSI Systems Co., Ltd. (Japan)
Akio Sato, Hitachi ULSI Systems Co., Ltd. (Japan)
Kyoji Nakajo, Hitachi ULSI Systems Co., Ltd. (Japan)
Masanori Shoji, Hitachi ULSI Systems Co., Ltd. (Japan)
Naomi Shimada, Hitachi ULSI Systems Co., Ltd. (Japan)
Hirokazu Sambayashi, Hitachi ULSI Systems Co., Ltd. (Japan)
Kenzo Goto, Hitachi ULSI Systems Co., Ltd. (Japan)
Fumio Murai, Hitachi, Ltd. (Japan)
Hiroshi Fukuda, Hitachi, Ltd. (Japan)


Published in SPIE Proceedings Vol. 5446:
Photomask and Next-Generation Lithography Mask Technology XI
Hiroyoshi Tanabe, Editor(s)

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