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Proceedings Paper

DUV ALTA system aerial image enhancement for improved pattern fidelity: phase II
Author(s): Michael E. Ungureit; Samuel C. Howells; T. Chabreck; J. Hubbard; Asher Klatchko; Peter Y. Pirogovsky; Robin L. Teitzel; Andrew Berwick; B. Skyborg; Paul C. Allen; Cris G. Morgante; Michael White
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Paper Abstract

The ALTA 4300 system has been used to successfully write many advanced designs previously only possible with 50kV VSB systems. In order to further enlarge the application space of this high productivity system, an aerial image enhancement technique has been developed to deliver mask patterns that more closely match the pattern data for corners and jogs. This image enhancement is done in real time in the ALTA system's rasterizer by modifying the gray level mapping of pixels near the corner vertexes. SEM measurements of corner rounding with standard rasterization and the enhanced rasterization show a 35% improvement of corner rounding radius from ~205 to ~132 nm. A direct comparison of SEM micrographs show little qualitative difference between vector scan mask features and those written with aerial image enhancement. This convincingly demonstrates that the ALTA 4300 system with the new image enhancement can write many layers requiring vector scan corner acuity.

Paper Details

Date Published: 20 August 2004
PDF: 14 pages
Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); doi: 10.1117/12.557806
Show Author Affiliations
Michael E. Ungureit, Etec Systems Inc. (United States)
Samuel C. Howells, Etec Systems Inc. (United States)
T. Chabreck, Etec Systems Inc. (United States)
J. Hubbard, Etec Systems Inc. (United States)
Asher Klatchko, Etec Systems Inc. (United States)
Peter Y. Pirogovsky, Etec Systems Inc. (United States)
Robin L. Teitzel, Etec Systems Inc. (United States)
Andrew Berwick, Etec Systems Inc. (United States)
B. Skyborg, Etec Systems Inc. (United States)
Paul C. Allen, Etec Systems Inc. (United States)
Cris G. Morgante, Etec Systems Inc. (United States)
Michael White, Etec Systems Inc. (United States)


Published in SPIE Proceedings Vol. 5446:
Photomask and Next-Generation Lithography Mask Technology XI
Hiroyoshi Tanabe, Editor(s)

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