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Proceedings Paper

The masks fabricated by UV LIGA for excimer laser ablation and x-ray lithography
Author(s): Jingqiu Liang; Zichun Le; Weibiao Wang; Liangqiang Peng; Weihua Lan; Anjie Ming; Jian Ye; Bisheng Quan; Jinsong Yao; Ming Xuan; Lijun Wang
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Paper Abstract

In the present paper, a mask structure called adhering mask for excimer laser ablation is introduced. This mask is fabricated directly on the etched material, so it needn't a supporting chip and it thus has high transmission. Its absorber is made of gold and is fabricated by UV LIGA technology. Therefore the mask has more accurate structure and more smooth edges. This mask can fulfill the direct etching of the polymers by using a simpler optical system and can be a method of the mass production to some extent. The other mask is developed for X-ray lithography. It is made by UV LIGA process too. It consists of the substrate, the absorber and the supporter. The substrate is made of PI and the absorber is prepared by gold. The structure, fabrication process and experiment results of this mask are given.

Paper Details

Date Published: 20 August 2004
PDF: 10 pages
Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); doi: 10.1117/12.557781
Show Author Affiliations
Jingqiu Liang, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Zichun Le, Zhejiang Univ. of Technology (China)
Weibiao Wang, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Liangqiang Peng, BEPC National Lab. (China)
Weihua Lan, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Anjie Ming, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Jian Ye, Zhejiang Univ. of Technology (China)
Bisheng Quan, Zhejiang Univ. of Technology (China)
Jinsong Yao, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Ming Xuan, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Lijun Wang, Changchun Institute of Optics, Fine Mechanics and Physics (China)


Published in SPIE Proceedings Vol. 5446:
Photomask and Next-Generation Lithography Mask Technology XI
Hiroyoshi Tanabe, Editor(s)

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