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Proceedings Paper

Evaluation of image placement of EPL stencil masks
Author(s): Satoshi Yusa; Mikio Ishikawa; Yoshinori Kinase; Tadahiko Takikawa; Hiroshi Fujita; Hisatake Sano; Morihisa Houga; Naoya Hayashi
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Paper Abstract

200-mm stencil masks for electron beam projection lithography (EPL) have been developed. Since they are not so rigid as photomasks because of their structure, 200-mm wafers with about 8,000 membrane windows, new metrological techniques dedicated to stencil masks have be introduced. Image placement (IP) accuracy of an EPL mask is evaluated with a suspension-type electrostatic chuck introduced to a Leica LMS IPRO. The dynamic repeatability of global IP measurements was 27 nm (3σ). It was confirmed that global IP errors were reduced to 60 nm (3σ, max) by linear-term and gravity corrections.

Paper Details

Date Published: 20 August 2004
PDF: 9 pages
Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); doi: 10.1117/12.557774
Show Author Affiliations
Satoshi Yusa, Dai Nippon Printing Co., Ltd. (Japan)
Mikio Ishikawa, Dai Nippon Printing Co., Ltd. (Japan)
Yoshinori Kinase, Dai Nippon Printing Co., Ltd. (Japan)
Tadahiko Takikawa, Dai Nippon Printing Co., Ltd. (Japan)
Hiroshi Fujita, Dai Nippon Printing Co., Ltd. (Japan)
Hisatake Sano, Dai Nippon Printing Co., Ltd. (Japan)
Morihisa Houga, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 5446:
Photomask and Next-Generation Lithography Mask Technology XI
Hiroyoshi Tanabe, Editor(s)

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