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Proceedings Paper

Visible-light inspection of EUVL multilayer mask blanks
Author(s): Takeo Hashimoto; Hiromasa Yamanashi; Shinji Miyagaki; Iwao Nishiyama
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Paper Abstract

Mask blank inspection is a critical issue in EUV lithography. Visible-light inspection has the advantages of a high throughput and a low tool cost, while actinic inspection potentially has a high inspection capability. The Hamamatsu Photonics Super Fine Particle Detection System, which employs dark-field scattering optics, has a high detection sensitivity and throughput. It is able to detect PSL spheres with diameters below 50 nm on a Si substrate. So, we tried using it to detect fine PSL spheres on Mo/Si multilayer mask blanks. 60-nm PSL spheres were detected, but noise arising from the surface roughness of the Mo/Si multilayer prevented the accurate detection of PSL spheres with diameters of less than 50 nm. Thus, it is important to reduce the surface roughness of the multilayer in order to improve the inspection capability of visible-light inspection systems.

Paper Details

Date Published: 20 August 2004
PDF: 10 pages
Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); doi: 10.1117/12.557772
Show Author Affiliations
Takeo Hashimoto, Association of Super-Advanced Electronics Technologies (Japan)
Hiromasa Yamanashi, Association of Super-Advanced Electronics Technologies (Japan)
Shinji Miyagaki, Association of Super-Advanced Electronics Technologies (Japan)
Iwao Nishiyama, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 5446:
Photomask and Next-Generation Lithography Mask Technology XI
Hiroyoshi Tanabe, Editor(s)

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