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Proceedings Paper

The guideline of reticle data management
Author(s): Norihiko Miyazaki; N. Iriki; M. Homma; T. Sato; M. Mori; Tadashi Imoriya; Toshio Onodera; T. Matsuda; Hidehiro Higashino; K. Okuda; Iwao Higashikawa; Nobuyuki Yoshioka
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Paper Abstract

We reported the Guideline(Ver. 1) of Reticle Data Management(RDM) Activity in 2001. Among we have been focused SoC(System on Chip) Business, we have been improved the efficiency over Design technology, Mask manufacturing and Wafer manufacturing. Especially, these subjects have been the lithography Cost including Reticle Cost, shorter life cycle of product, more difficult technique, lower cost and shorter total TAT from design to chip shipping. Guideline Ver 1.0 announced the standardization of interface contents over Design to Mask manufacture, and to wafer manufacture. Guideline Ver 2.0 will announce this RDM activity has been developed the optimization of a new engineering chain management in addition to the pattern data and the linkage to EDA in 2003.

Paper Details

Date Published: 20 August 2004
PDF: 12 pages
Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); doi: 10.1117/12.557741
Show Author Affiliations
Norihiko Miyazaki, Japan Electronics and Information Technology Industries Association (Japan)
N. Iriki, Japan Electronics and Information Technology Industries Association (Japan)
M. Homma, Japan Electronics and Information Technology Industries Association (Japan)
T. Sato, Japan Electronics and Information Technology Industries Association (Japan)
M. Mori, Japan Electronics and Information Technology Industries Association (Japan)
Tadashi Imoriya, Japan Electronics and Information Technology Industries Association (Japan)
Toshio Onodera, Japan Electronics and Information Technology Industries Association (Japan)
T. Matsuda, Japan Electronics and Information Technology Industries Association (Japan)
Hidehiro Higashino, Japan Electronics and Information Technology Industries Association (Japan)
K. Okuda, Japan Electronics and Information Technology Industries Association (Japan)
Iwao Higashikawa, Japan Electronics and Information Technology Industries Association (Japan)
Nobuyuki Yoshioka, Japan Electronics and Information Technology Industries Association (Japan)


Published in SPIE Proceedings Vol. 5446:
Photomask and Next-Generation Lithography Mask Technology XI
Hiroyoshi Tanabe, Editor(s)

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