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Proceedings Paper

Improvement of unified mask data formats for EB writers
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Paper Abstract

Mask data preparation (MDP) is a complicated process because many kinds of EB data files and jobdeck data files are used in mask manufacturers and EB data files continue to become bigger. Therefore we have developed unified mask data formats for Variable-Shaped-Beam (VSB) EB writers with efficient data compaction. The unified mask data formats are composed of a pattern data format for EB writers named "NEO" and a layout format named "MALY". We released NEO and MALY on April 2003. To evaluate NEO and MALY, we have made a prototype system of MDP such as a converter from design data to NEO/MALY and converters from NEO/MALY to each EB data. We have evaluated about functions and performance of the MDP flow using real design data in device manufacturers. As a result, some improvements in NEO and MALY were achieved and we have revised the specification of NEO and MALY as the final version. We have confirmed that NEO and MALY can be used for a set of unified mask data formats among VSB EB writers and can reduce complexity of mask data handling in mask manufacturers. They will be put to practical use in MDP flow.

Paper Details

Date Published: 20 August 2004
PDF: 8 pages
Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); doi: 10.1117/12.557738
Show Author Affiliations
Toshio Suzuki, Semiconductor Leading Edge Technologies, Inc. (Japan)
Junji Hirumi, Semiconductor Leading Edge Technologies, Inc. (Japan)
Nobuyuki Yoshioka, Semiconductor Leading Edge Technologies, Inc. (Japan)
Yutaka Hojyo, Hitachi High-Technologies Corp. (Japan)
Yuichi Kawase, JEOL Ltd. (Japan)
Shigehiro Hara, NuFlare Technology Inc. (Japan)
Koki Kuriyama, Dai Nippon Printing Co., Ltd. (Japan)
Morihisa Hoga, Dai Nippon Printing Co., Ltd. (Japan)
Satoshi W. Watanabe, Dai Nippon Printing Co., Ltd. (Japan)
Hidemichi Kawase, Seiko Instruments Inc. (Japan)
Tomoko Kamimoto, Seiko Instruments Inc. (Japan)
Kokoro Kato, SII NanoTechnology Inc. (Japan)


Published in SPIE Proceedings Vol. 5446:
Photomask and Next-Generation Lithography Mask Technology XI
Hiroyoshi Tanabe, Editor(s)

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