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Proceedings Paper

FIB mask repair technology for electron projection lithography
Author(s): Yoh Yamamoto; Masakatsu Hasuda; Hiroyuki Suzuki; Makoto Sato; Osamu Takaoka; Hiroshi Matsumura; Noboru Matsumoto; Kouji Iwasaki; Ryoji Hagiwara; Katsumi Suzuki; Yutaka Ikku; Kazuo Aita; Takashi Kaito; Tatsuya Adachi; Anto Yasaka; Jiro Yamamoto; Teruo Iwasaki; Masaki Yamabe
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Paper Abstract

We have studied stencil mask repair technology with focused ion beam and developed an advanced mask repair tool for electron projection lithography. There were some challenges in the stencil mask repair, which were mainly due to its 3-dimensional structure with aspect ratio more than 10. In order to solve them, we developed some key technologies with focused ion beam (FIB). The transmitted FIB detection technique is a reliable imaging method for a 3-dimensional stencil mask. This technique makes it easy to observe deep patterns of the stencil mask and to detect the process endpoint. High-aspect processing can be achieved using gas-assisted etching (GAE) for a stencil mask. GAE enables us to repair mask patterns with aspect ratio more than 50 and very steep sidewall angle within 90±1°precisely. Edge placement accuracy of the developed tool is about 14nm by manual operation. This tool is capable to achieve less than 10nm by advanced software. It was found that FIB technology had capability to satisfy required specifications for EPL mask repair.

Paper Details

Date Published: 20 August 2004
PDF: 9 pages
Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); doi: 10.1117/12.557731
Show Author Affiliations
Yoh Yamamoto, SII Nanotechnology Inc. (Japan)
Masakatsu Hasuda, SII Nanotechnology Inc. (Japan)
Hiroyuki Suzuki, SII Nanotechnology Inc. (Japan)
Makoto Sato, SII Nanotechnology Inc. (Japan)
Osamu Takaoka, SII Nanotechnology Inc. (Japan)
Hiroshi Matsumura, SII Nanotechnology Inc. (Japan)
Noboru Matsumoto, SII Nanotechnology Inc. (Japan)
Kouji Iwasaki, SII Nanotechnology Inc. (Japan)
Ryoji Hagiwara, SII Nanotechnology Inc. (Japan)
Katsumi Suzuki, SII Nanotechnology Inc. (Japan)
Yutaka Ikku, SII Nanotechnology Inc. (Japan)
Kazuo Aita, SII Nanotechnology Inc. (Japan)
Takashi Kaito, SII Nanotechnology Inc. (Japan)
Tatsuya Adachi, SII Nanotechnology Inc. (Japan)
Anto Yasaka, SII Nanotechnology Inc. (Japan)
Jiro Yamamoto, Semiconductor Leading Edge Technologies, Inc. (Japan)
Teruo Iwasaki, Semiconductor Leading Edge Technologies, Inc. (Japan)
Masaki Yamabe, Semiconductor Leading Edge Technologies, Inc. (Japan)


Published in SPIE Proceedings Vol. 5446:
Photomask and Next-Generation Lithography Mask Technology XI
Hiroyoshi Tanabe, Editor(s)

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